標(biāo)準(zhǔn)號(hào)：ISO 17331-2004
中文標(biāo)準(zhǔn)名稱：表面化學(xué)分析.從硅片工作基準(zhǔn)材料表面采集元素的化學(xué)方法及其全反射X射線熒光光譜法的測(cè)定
英文標(biāo)準(zhǔn)名稱：Surface chemical analysis - Chemical methods for the collection of elements from the surface of silicon-wafer working reference materials and their determination by total-reflection X-ray fluorescence (TXRF) spectroscopy
標(biāo)準(zhǔn)類型：G04
發(fā)布日期：1999/12/31 12:00:00
實(shí)施日期：1999/12/31 12:00:00
中國(guó)標(biāo)準(zhǔn)分類號(hào)：G04
國(guó)際標(biāo)準(zhǔn)分類號(hào)：71.040.50
適用范圍：This International Standard specifies chemical methods for the collection of iron and/or nickel from the surfaceof silicon-wafer working reference materials by the vapour-phase decomposition method or the direct aciddroplet decomposition method.This International Standard applies to iron and/or nickel atomic surface densities from 6 × 109 atoms/cm2 to5 × 1011 atoms/cm2.