標(biāo)準(zhǔn)號：BS EN 62047-2-2006
中文標(biāo)準(zhǔn)名稱：半導(dǎo)體器件.微型機(jī)電器件.薄膜材料的拉伸試驗(yàn)方法
英文標(biāo)準(zhǔn)名稱：Semiconductor devices - Micro-electromechanical devices - Part 2: Tensile testing method of thin film materials
標(biāo)準(zhǔn)類型：L40
發(fā)布日期：2006/11/30 12:00:00
實(shí)施日期：2006/11/30 12:00:00
中國標(biāo)準(zhǔn)分類號：L40
國際標(biāo)準(zhǔn)分類號：31.080.01;31.080.99
引用標(biāo)準(zhǔn)：ISO 6892
適用范圍：This International Standard specifies the method for tensile testing of thin film materials with length and width under 1 mm and thickness under 10 μm, which are main structural materials for micro-electromechanical systems (MEMS), micromachines and similar devices.The main structural materials for MEMS, micromachines and similar devices have special features such as typical dimensions in the order of a few microns, a material fabrication by deposition, and a test piece fabrication by non-mechanical machining using etching andphotolithography. This International Standard specifies the testing method, which enables a guarantee of accuracy corresponding to the special features.