標(biāo)準(zhǔn)號(hào)：ISO 16531-2013
中文標(biāo)準(zhǔn)名稱：表面化學(xué)分析.深度剖析.原子發(fā)射光譜(AES)和光電子能譜(XPS)中深度剖析用電流或電流密度的離子束校正和相關(guān)測(cè)量方法
英文標(biāo)準(zhǔn)名稱：Surface chemical analysis - Depth profiling - Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
標(biāo)準(zhǔn)類型：G04
發(fā)布日期：2013/6/1 12:00:00
實(shí)施日期：1999/12/31 12:00:00
中國(guó)標(biāo)準(zhǔn)分類號(hào)：G04
國(guó)際標(biāo)準(zhǔn)分類號(hào)：71.040.40
引用標(biāo)準(zhǔn)：ISO 18115-1
適用范圍：This International Standard specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy and X-ray photoelectron spectroscopy. These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size below ~1 mm in diameter. The methods do not include depth resolution optimization.