標(biāo)準(zhǔn)號(hào)：ISO/TR 22335-2007
中文標(biāo)準(zhǔn)名稱：表面化學(xué)分析.深度剖面.濺射速率測(cè)量:使用機(jī)械光針式輪廓儀的網(wǎng)眼復(fù)制法
英文標(biāo)準(zhǔn)名稱：Surface chemical analysis - Depth profiling - Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer
標(biāo)準(zhǔn)類型：A43
發(fā)布日期：2007/7/1 12:00:00
實(shí)施日期：1999/12/31 12:00:00
中國(guó)標(biāo)準(zhǔn)分類號(hào)：A43
國(guó)際標(biāo)準(zhǔn)分類號(hào)：71.040.40
適用范圍：This Technical Report describes a method for determining ion-sputtering rates for depth profilingmeasurements with Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) wherethe specimen is ion-sputtered over a region with an area between 0,4 mm2 and 3,0 mm2. This TechnicalReport is applicable only to a laterally homogeneous bulk or single-layered material where the ion-sputteringrate is determined from the sputtered depth, as measured by a mechanical stylus profilometer, and sputteringtime.This Technical Report provides a method to convert the ion-sputtering time scale to sputtered depth in a depthprofile by assuming a constant sputtering velocity. This method has not been designed for, or tested using, ascanning probe microscope system. It is not applicable to the case where the sputtered area is less than0,4 mm2 or where the sputter-induced surface roughness is significant compared with the sputtered depth tobe measured